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Proceedings Paper

Methods for the design of microelectronic devices and process flows for manufacturability
Author(s): Sharad Saxena; Richard Burch; P. K. Mozumder; Karthik Vasanth; Suraj Rao; Joe Davis; Chenjing Fernando
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Paper Abstract

Small feature sizes and reduced tolerances of state-of-the-art microelectronic devices make them extremely sensitive to manufacturing variations. This paper describes two approaches dealing with manufacturing variations: process control and statistical design for manufacturability. Process control seeks to reduce the variability of each process module and statistical design seeks to minimize the impact of the variability. An example illustrates the use of process control to minimize variability. Then, a novel approach for statistical design and its application to statistical optimization of deep submicron CMOS is described. This approach is based on a Markov representation of a process flow that captures the sequential and stochastic nature of semiconductor manufacturing. Using this approach we have been able to predict the variability in device performance for a number of process flows. Transistor designs and process flows optimized using this approach show lower variation in key device performances on fabrication.

Paper Details

Date Published: 27 August 1997
PDF: 6 pages
Proc. SPIE 3212, Microelectronic Device Technology, (27 August 1997); doi: 10.1117/12.284600
Show Author Affiliations
Sharad Saxena, Texas Instruments Inc. (United States)
Richard Burch, Texas Instruments Inc. (United States)
P. K. Mozumder, Texas Instruments Inc. (United States)
Karthik Vasanth, Texas Instruments Inc. (United States)
Suraj Rao, Texas Instruments Inc. (United States)
Joe Davis, Texas Instruments Inc. (United States)
Chenjing Fernando, Texas Instruments Inc. (United States)

Published in SPIE Proceedings Vol. 3212:
Microelectronic Device Technology
Mark Rodder; Toshiaki Tsuchiya; David Burnett; Dirk Wristers, Editor(s)

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