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Proceedings Paper

Structure design and fabrication of symmetric force-balance micromachining capacitive accelerometer
Author(s): Qiang Zou; Deren Lu; Baoqing Li; Xingguo Xiong; Bin Xiong; Weiyuan Wang
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Paper Abstract

A novel KOH silicon maskless anisotropic etching technology is adopted to fabricate micromachining silicon mass-beam structure accelerometer. Lateral sensitivity effect in normal accelerometer is eliminated because the beams which are thinner than 15 micrometers have been formed in the middle of the seismic mass. Based on the calculation of sensitivity and basic resonance frequency of two kinds of bulk micromachining accelerometers, the structure parameters of cantilever and double-side-supported accelerometer have been optimized by using the sensitivity-frequency product as the figure of merit of a structure. The different etching characteristics of {311} and {100} plane of silicon in KOH maskless anisotropic etching process have been investigated thoroughly and utilized in the fabrication of symmetric mass- beam structure. Special damping design has been proposed to reduce the damping ratio of the device in order to improve the dynamic performance of the accelerometer. Preliminary measurement of the static characteristics of the structure has been performed with a force-deflection balance measurement apparatus.

Paper Details

Date Published: 5 September 1997
PDF: 10 pages
Proc. SPIE 3223, Micromachining and Microfabrication Process Technology III, (5 September 1997); doi: 10.1117/12.284492
Show Author Affiliations
Qiang Zou, Shanghai Institute of Metallurgy (China)
Deren Lu, Shanghai Institute of Metallurgy (China)
Baoqing Li, Shanghai Institute of Metallurgy (China)
Xingguo Xiong, Shanghai Institute of Metallurgy (China)
Bin Xiong, Shanghai Institute of Metallurgy (China)
Weiyuan Wang, Shanghai Institute of Metallurgy (China)

Published in SPIE Proceedings Vol. 3223:
Micromachining and Microfabrication Process Technology III
Shih-Chia Chang; Stella W. Pang, Editor(s)

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