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Proceedings Paper

Proposal for polymer photonic bandgap materials fabricated by dry etching and diffusion
Author(s): Hans W. P. Koops
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Paper Abstract

A method to produce polymer-based passive and active photonic bandgap devices for integrated optics is described. The aim of the method is to implement low-cost active and passive opto-electronic devices of high quality with a high degree of integration and high packing density. A structurable resist or polymer layer of high quality is placed onto an opto-electronic substrate. An etching mask and a high-grade anisotropical in-depth etching process are used to generate a structure which can be used as a photonic bandgap material. The permittivity of the structure is changed by filling the polymer structure with monomers by means of a vapor-phase or liquid-phase diffusion. Depending on the monomer type used for diffusion as well as on temperature and on interaction time, the optical properties of an optical element can be changed selectively. The method described will make possible an increase in the packing density of future integrated optics and low-cost production of large quantities alike.

Paper Details

Date Published: 22 September 1997
PDF: 6 pages
Proc. SPIE 3135, Precision Plastic Optics for Optical Storage, Displays, Imaging, and Communications, (22 September 1997);
Show Author Affiliations
Hans W. P. Koops, Technologiezentrum Deutsche Telekom AG (Germany)

Published in SPIE Proceedings Vol. 3135:
Precision Plastic Optics for Optical Storage, Displays, Imaging, and Communications
Werner F. Frank, Editor(s)

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