In this paper a method is introduced which makes it possible to choose the paraxial field distribution generated by a diffractive element independently for two perpendicular polarization directions. For that the local transmission of a binary element is controlled by metal-stripe subwavelength gratings of different grating directions fabricated by electron beam lithography. The method based upon the property of these gratings to influence the intensity of an incident wave dependent on their polarization direction. In first experiments such diffractive amplitude elements have been fabricated successfully with the electron beam lithography system LION LV1.

Date Published: 24 September 1997
PDF: 6 pages
Proc. SPIE 3099, Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications, (24 September 1997); doi: 10.1117/12.281237

Published in SPIE Proceedings Vol. 3099:
Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications
Olivier M. Parriaux; Ernst-Bernhard Kley; Brian Culshaw; Magnus Breidne, Editor(s)