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Proceedings Paper

Large-field, high-resolution photolithography
Author(s): Francis S. M. Clube; Simon Gray; Denis Struchen; Stephane Malfoy; Yves Darbellay; Nicolas Magnon; Bertrand Le Gratiet; Jean-Claude Tisserand
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Paper Abstract

Holographic lithography's unique capacity for high- resolution and large-area pattern transfer offers significant advantages for fabricating a range of optical microsystems. Two industrialized models of lithographic system have been constructed. The first has an imaging resolution of 0.25 micrometers over an exposure field of 6' X 6' and can print onto a variety of substrate types of dimensions up to 6' X 6'. It includes an alignment system permitting a pattern-to-pattern overlay accuracy of 0.3 micrometers (3(sigma) value). The second model combines an imaging resolution of 0.25 micrometers with an exposure field of 10' X 12' and prints onto substrates up to 470 mm X 370 mm. This system has a substrate stepping capability allowing a pattern to be replicated many times onto the substrate, and an alignment system providing 0.5 micrometers overlay accuracy. Both models operate at an exposure wavelength of 364 nm, making them compatible with standard i-line photoresist processing. The technology has been successfully employed for printing grating structures with periods down to 0.5 micrometers for such applications as high-resolution encoders and optical interconnects.

Paper Details

Date Published: 24 September 1997
PDF: 10 pages
Proc. SPIE 3099, Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications, (24 September 1997); doi: 10.1117/12.281232
Show Author Affiliations
Francis S. M. Clube, Holtronic Technologies SA (Switzerland)
Simon Gray, Holtronic Technologies SA (Switzerland)
Denis Struchen, Holtronic Technologies SA (Switzerland)
Stephane Malfoy, Holtronic Technologies SA (Switzerland)
Yves Darbellay, Holtronic Technologies SA (Switzerland)
Nicolas Magnon, Holtronic Technologies SA (Switzerland)
Bertrand Le Gratiet, Holtronic Technologies SA (Switzerland)
Jean-Claude Tisserand, Holtronic Technologies SA (Switzerland)

Published in SPIE Proceedings Vol. 3099:
Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications
Olivier M. Parriaux; Ernst-Bernhard Kley; Brian Culshaw; Magnus Breidne, Editor(s)

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