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Proceedings Paper

Best process focus and machine focus: adding focus offset to optimize photolithography process for VLSI manufacturing
Author(s): Yi-Chuan Lo; Chih-Hsiung Lee; Yang-Tung Fan; Chih-Kung Chang
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Paper Abstract

The focus window of various topographies and substrate was discussed in this paper. Also the electric test data and Cp yield with different focus will be introduced. Finally, the usable depth of focus and auto focus system will be applied to describe the difference between machine and process best focus.

Paper Details

Date Published: 14 August 1997
PDF: 10 pages
Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); doi: 10.1117/12.280544
Show Author Affiliations
Yi-Chuan Lo, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Chih-Hsiung Lee, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Yang-Tung Fan, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Chih-Kung Chang, Taiwan Semiconductor Manufacturing Co. (Taiwan)

Published in SPIE Proceedings Vol. 3183:
Microlithographic Techniques in IC Fabrication
Soon Fatt Yoon; Raymond Yu; Chris A. Mack, Editor(s)

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