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Proceedings Paper

Measurements and analysis of beam current and beam diameter of an electron-beam lithography system
Author(s): Wu Lu; Geok Ing Ng; Soon Fatt Yoon; Hao-Ying Shen
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Paper Abstract

An accurate method to measure beam current (BC) and beam diameter (BD) of an electron beam lithography by using a Faraday cup and a sharp edge is described. The sharp edge specimen was fabricated by an isotropic process in < 100 > silicon wafer which yielded a high etch rate ratio and gave exceptionally smooth etched faces. The saw-tooth of the edge was less than 30 nm. Detailed investigations about the measured BS and BD at various conditions showed that BC and the square of BD were linear with an offset, which was the sum of optical aberrations, noise, and edge width.

Paper Details

Date Published: 14 August 1997
PDF: 8 pages
Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); doi: 10.1117/12.280537
Show Author Affiliations
Wu Lu, Nanyang Technological Univ. (Singapore)
Geok Ing Ng, Nanyang Technological Univ. (Singapore)
Soon Fatt Yoon, Nanyang Technological Univ. (Singapore)
Hao-Ying Shen, Nanjing Electronic Devices Institute (China)

Published in SPIE Proceedings Vol. 3183:
Microlithographic Techniques in IC Fabrication
Soon Fatt Yoon; Raymond Yu; Chris A. Mack, Editor(s)

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