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Proceedings Paper

Interferometric testing of EUV lithography cameras
Author(s): Alastair A. MacDowell; Obert R. Wood II; John E. Bjorkholm
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Paper Abstract

Phase-measuring, lateral-shearing interferometry has been carried out on a multilayer-coated extreme-ultraviolet (EUV) Schwarzschild camera at the multilayer coating's center wavelength. The measured wavefront error was 0.096 waves rms at a wavelength of 13.5 nm. The interferometer employed in the measurement was developed to evaluate the image quality and improve the alignment of cameras for EUV lithography and was previously shown to have a sensitivity of 0.021 waves rms or better at an operating wavelength of 13 nm.

Paper Details

Date Published: 1 November 1997
PDF: 9 pages
Proc. SPIE 3152, Materials, Manufacturing, and Measurement for Synchrotron Radiation Mirrors, (1 November 1997); doi: 10.1117/12.279372
Show Author Affiliations
Alastair A. MacDowell, Lucent Technologies Bell Labs. and Brookhaven National Lab. (United States)
Obert R. Wood II, Lucent Technologies Bell Labs. (United States)
John E. Bjorkholm, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 3152:
Materials, Manufacturing, and Measurement for Synchrotron Radiation Mirrors
Peter Z. Takacs; Thomas W. Tonnessen, Editor(s)

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