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Proceedings Paper

Effect of TPD:CuPc LB films as electron blocking layer on EL emission
Author(s): Yulin Hua; Xiaohui Yang; Yanbing Hou; Junbiao Peng; Xiulan Feng
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Paper Abstract

In organic thin film electroluminescence device with ITO/PPV/TPD:CuPc/Alq:DCMl/Al structure, the TPD:CuPc Langmuir-Blodgett (LB) film as electron-blocking layer was inserted between PPV and Alq:DCMl layer. A device without TPD:CuPc layer or a device with monolayer of TPD:CuPc which was applied at higher DC voltage exhibited EL emission from both the PPV and Alq:DCMl layers. Whereas a device with monolayer of TPD:CuPc layer which was applied at lower voltage or a device with double layers of TPD:CuPc had an EL emission only from Alq:DCMl layer implying that the TPD:CuPc layer can effectively block the electrons and the Alq:DCMl electron transport layer worked as the emitting layer. Hence, we can spatially control the recombination zone and obtain different EL emission by adjusting the thickness of carrier blocking layer.

Paper Details

Date Published: 1 December 1997
PDF: 4 pages
Proc. SPIE 3148, Organic Light-Emitting Materials and Devices, (1 December 1997); doi: 10.1117/12.279334
Show Author Affiliations
Yulin Hua, Tianjin Institute of Technology (China)
Xiaohui Yang, Tianjin Institute of Technology (China)
Yanbing Hou, Northern Jiaotong Univ. (China)
Junbiao Peng, Changchun Institute of Physics (China)
Xiulan Feng, Tianjin Institute of Technology (China)

Published in SPIE Proceedings Vol. 3148:
Organic Light-Emitting Materials and Devices
Zakya H. Kafafi, Editor(s)

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