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Proceedings Paper

Near-field modeling versus optical ray modeling of extended halogen light source in computer design of a reflector
Author(s): Peter V. Shmelev; Brij M. Khorana
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Paper Abstract

A near-field modeling technique was applied to modeling of a halogen extended light source. The modeling was performed to create a continuous set of rays which can then be used in raytracing for the purpose of designing a reflector. The near- field modeling was implemented by acquiring a series of images of the source using CCD camera with wide-angle lens focused at infinity. Optical ray model, which involved geometrical and ray modeling of the source to match its measured luminous intensity distribution, was also developed. Luminous intensity distribution as well as illuminance pattern from a reflector/source combination, calculated using near-field and optical ray models, were compared. It is demonstrated, in this paper, that near-field modeling technique has several advantages over the optical ray modeling technique when used for computer design of reflectors.

Paper Details

Date Published: 26 September 1997
PDF: 6 pages
Proc. SPIE 3140, Photometric Engineering of Sources and Systems, (26 September 1997); doi: 10.1117/12.279225
Show Author Affiliations
Peter V. Shmelev, Rose-Hulman Institute of Technology (United States)
Brij M. Khorana, Rose-Hulman Institute of Technology (United States)

Published in SPIE Proceedings Vol. 3140:
Photometric Engineering of Sources and Systems
Angelo V. Arecchi, Editor(s)

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