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Proceedings Paper

Proximity effect correction for reticle fabrication
Author(s): Takashi Kamikubo; Takayuki Abe; Susumu Oogi; Hirohito Anze; Mitsuko Shimizu; Masamitsu Itoh; Tetsuro Nakasugi; Tomohiro Iijima; Yoshiaki Hattori
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Paper Abstract

Proximity effect correction is a key technology for fabricating reticles by electron beam writing systems. To write patterns of 1 Gbit or higher-capacity DRAMs, the dimensional accuracy required for the correction is better than about 10 nm. Conventional methods do not have sufficient accuracy at the position where pattern density changes sharply. We propose a new correction method with higher accuracy for various patterns and show that we can achieve corrections accurate to about 5 nm.

Paper Details

Date Published: 28 July 1997
PDF: 5 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277291
Show Author Affiliations
Takashi Kamikubo, Toshiba Corp. (Japan)
Takayuki Abe, Toshiba Corp. (Japan)
Susumu Oogi, Toshiba Corp. (Japan)
Hirohito Anze, Toshiba Corp. (Japan)
Mitsuko Shimizu, Toshiba Corp. (Japan)
Masamitsu Itoh, Toshiba Corp. (Japan)
Tetsuro Nakasugi, Toshiba Corp. (Japan)
Tomohiro Iijima, Toshiba Machine Corp. (Japan)
Yoshiaki Hattori, Toshiba Machine Corp. (Japan)

Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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