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Proceedings Paper

Database inspection capability for the high-grade device
Author(s): NamKyu Park; Hwa-Sup Bae; Jong-woon Chang; Seung-Woo Yoo
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Paper Abstract

Recently, as the design rule of the device is rapidly tightened, defect control is more critical and high-end masks like 256 M and 1 G DRAM level have difficulty for database inspection due to high data volume, data density, OPC, etc. Therefore, it is necessary to evaluate the machine capability of database inspection and defect capture ability for critical layer. For the experiment, we prepared three test plates that have tight CD design and extreme small OPC patterns, and one of them is combined by 4 different layers as metal, contact, ipso, and poly and design rule is 1.0 - 1.5 micrometer. And we shrinked the some area (80, 75%) for confirming the limitation of DB inspection. Through this evaluation, we tried to identify current barriers such as CD uniformity problem, and overcome the barriers and find ways how to improve the inspection capability.

Paper Details

Date Published: 28 July 1997
PDF: 10 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277288
Show Author Affiliations
NamKyu Park, DuPont Photomasks Korea Ltd. (South Korea)
Hwa-Sup Bae, DuPont Photomasks Korea Ltd. (South Korea)
Jong-woon Chang, DuPont Photomasks Korea Ltd. (South Korea)
Seung-Woo Yoo, KLA Instruments Corp. (United States)

Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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