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Proceedings Paper

ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks
Author(s): Yuko Seki; Jun Ushioda; Takashi Saito; Katsumi Maeda; Kaichiro Nakano; Shigeyuki Iwasa; Takeshi Ohfuji; Hiroshi Tanabe
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Paper Abstract

The exposure durability of chromium fluoride (CrF) was evaluated for phase shifter material in ArF excimer laser lithography. The film quality changes after 193 nm light irradiation were measured by using an optical spectroscope, an x-ray photoelectron spectroscopy (XPS), and an atomic force microscope (AFM). The film quality changes, such as decline of transmittance, surface oxidation, and roughness, were occurred in the sample irradiated in air, while little change were observed in nitrogen atmosphere.

Paper Details

Date Published: 28 July 1997
PDF: 8 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277260
Show Author Affiliations
Yuko Seki, NEC Corp. (Japan)
Jun Ushioda, NEC Corp. (Japan)
Takashi Saito, NEC Corp. (Japan)
Katsumi Maeda, NEC Corp. (Japan)
Kaichiro Nakano, NEC Corp. (Japan)
Shigeyuki Iwasa, NEC Corp. (Japan)
Takeshi Ohfuji, Yokohama Research Ctr./Association of Super-Advanced Electronics Technologies (Japan)
Hiroshi Tanabe, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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