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Proceedings Paper

Current status of the SR stepper development
Author(s): Nobutoshi Mizusawa; Yutaka Watanabe; Shinichi Hara; Kenji Saitoh; Hiroshi Maehara; Mitsuaki Amemiya; Shunichi Uzawa
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Paper Abstract

We describe some results of exposure experiments using the present prototype SR stepper which Canon has developed and also describe the novel technology development which is necessary to establish the next generation SR stepper for volume production. In the evaluation of the prototype machine, alignment performance, stage accuracy, and printing performance were examined, and we found the SR lithography can be applied to manufacturing devices beyond 0.15 micrometer level. In the technology development for the production machine, we have examined methods related to masks; they are reduction of thermal expansion, suppression out-of-plane displacement of mask membrane, and magnification correction. As a result of the examinations, we have a good perspective in development of a high-throughput SR stepper which is suitable for the production beyond 1 G-bit DRAM.

Paper Details

Date Published: 28 July 1997
PDF: 10 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277256
Show Author Affiliations
Nobutoshi Mizusawa, Canon Inc. (Japan)
Yutaka Watanabe, Canon Inc. (Japan)
Shinichi Hara, Canon Inc. (Japan)
Kenji Saitoh, Canon Inc. (Japan)
Hiroshi Maehara, Canon Inc. (Japan)
Mitsuaki Amemiya, Canon Inc. (Japan)
Shunichi Uzawa, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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