Proceedings Paper
Hierarchical mask data design system (PROPHET) for aerial image simulation, automatic phase-shifter placement, and subpeak overlap checking| Format | Member Price | Non-Member Price |
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Paper Abstract
A hierarchical and interactive mask data design system (PROPHET) has been developed for aerial image simulation, fast subpeak overlap checking of adjacent patterns in attenuated phase-shifting masks, and automatic phase-shifter placement. This system, linked with a layout editor through an added-on menu, allows the designer to perform layout while concurrently considering mask data, taking into account design restrictions imposed by ultra-high resolution technology.
Paper Details
Date Published: 28 July 1997
PDF: 10 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997);
Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)
PDF: 10 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997);
Show Author Affiliations
Eiji Tsujimoto, Hitachi, Ltd. (Japan)
Takahiro Watanabe, Hitachi, Ltd. (Japan)
Yoshio Sato, Hitachi, Ltd. (Japan)
Takahiro Watanabe, Hitachi, Ltd. (Japan)
Yoshio Sato, Hitachi, Ltd. (Japan)
Akemi Moniwa, Hitachi, Ltd. (Japan)
Yoshinobu Igarashi, Hitachi, Ltd. (Japan)
Kyoji Nakajo, Hitachi ULSI Engineering Corp. (Japan)
Yoshinobu Igarashi, Hitachi, Ltd. (Japan)
Kyoji Nakajo, Hitachi ULSI Engineering Corp. (Japan)
Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)
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