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Proceedings Paper

Low-cost patterning and etching systems for production of microelectronic modules
Author(s): Kanti Jain; Thomas J. Dunn
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Paper Abstract

Anvik Corporation has developed a class of novel projection systems that provide both high-throughput resist patterning and dielectric photoetching for production of a variety of electronic modules including flat panel displays, multichip modules, microelectromechanical systems, and printed circuit boards. This new technology eliminates the limitations of current lithography tools, including contact and proximity tools, conventional projection systems, steppers and scanners, and direct-write machines. Further, the Anvik system is highly modular, thereby providing equipment upgradability as well as choice of user-specified system configurations. These results are achieved with a novel seamless scanning concept and stage system configurations that provide both high optical and scanning efficiencies, and enable incorporation of a high-speed automatic part loader and an automatic alignment system. We describe the new technology and present results which demonstrate 3 micron resolution in commercial photoresists.

Paper Details

Date Published: 19 June 1997
PDF: 5 pages
Proc. SPIE 3046, Smart Structures and Materials 1997: Smart Electronics and MEMS, (19 June 1997); doi: 10.1117/12.276627
Show Author Affiliations
Kanti Jain, Anvik Corp. (United States)
Thomas J. Dunn, Anvik Corp. (United States)

Published in SPIE Proceedings Vol. 3046:
Smart Structures and Materials 1997: Smart Electronics and MEMS
Vijay K. Varadan; Paul J. McWhorter, Editor(s)

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