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Simulation of reflective notching with TEMPEST
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Paper Abstract

Reflective notching from projection printing a narrow feature over a reflective topography was simulated with the 3D electro-magnetic simulation program TEMPEST. Various topographical and optical parameters were varied to determine their effect on the reflective notching and to gain insight into the mechanism of reflective notching. It was determined that corner angles in the topography and anti-reflection coating use are important parameters while resist surface angle and polarization are not.

Paper Details

Date Published: 7 July 1997
PDF: 11 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276039
Show Author Affiliations
Thomas V. Pistor, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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