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Proceedings Paper

Influence of optical nonlinearities of the photoresist on the photolithographic process: basics
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Paper Abstract

Several commercial photoresists are characterized with respect to their changes of the real part of the refractive index during the bleaching process. A finite difference beam propagation algorithm is used to evaluate the impact of these refractive index changes on the lithographic process. It is shown, that the refractive index changes result in modified process windows, side wall angles, swing curves and iso/dense behavior.

Paper Details

Date Published: 7 July 1997
PDF: 12 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276032
Show Author Affiliations
Andreas Erdmann, Fraunhofer Institute for Silicon Technology (Germany)
Clifford L. Henderson, Univ. of Texas/Austin (United States)
C. Grant Willson, Univ. of Texas/Austin (United States)
Wolfgang Henke, Fraunhofer Institute for Silicon Technology (Germany)

Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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