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Proceedings Paper

Practical 3D lithography simulation system
Author(s): Hirotomo Inui; Hirokatsu Kaneko; Keiichiro Tounai; Kiroyoshi Tanabe; Toshiyuki Ohta
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Paper Abstract

We have developed a 3D practical lithography simulation system and realized the practical parameter optimization. A very fast 3D profile computation is performed by using the FFT algorithm in aerial images and the post exposure bake. The optimization system is developed by using object- oriented technology in order to reduce the computation time. The resulted computational time is less than one tenth of the conventional system. The total parameter optimization time is also reduced.

Paper Details

Date Published: 7 July 1997
PDF: 7 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276031
Show Author Affiliations
Hirotomo Inui, NEC Corp. (Japan)
Hirokatsu Kaneko, NEC Corp. (Japan)
Keiichiro Tounai, NEC Corp. (Japan)
Kiroyoshi Tanabe, NEC Corp. (Japan)
Toshiyuki Ohta, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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