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Proceedings Paper

Three-dimensional nonplanar lithography simulation using a periodic fast multipole method
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Paper Abstract

This paper discusses an extension of the fast multipole method to electromagnetic scattering from doubly periodic, multilayer wafer topography. The novelty of our approach lies in the use of a pseudo-periodic translation operator which can be computed efficiently using fast Fourier transform. Results obtained using the rigorous boundary conditions for dielectric surfaces are compared with those obtained using the approximate impedance boundary condition. The latter is shown to give good results for the type of topography usually encountered in lithography simulation. Results of reflective-notching simulation using the IBC method are presented.

Paper Details

Date Published: 7 July 1997
PDF: 13 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276030
Show Author Affiliations
Michael S. Yeung, Boston Univ. (United States)
Eytan Barouch, Boston Univ. (United States)

Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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