Proceedings Paper
New approach to data preparation and processing for high-density patterns| Format | Member Price | Non-Member Price |
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Paper Abstract
A modern pattern generator needs very high data-handling capacity, partly because the number of features per mask is growing, partly because OPC and other sophisticated lithographic enhancements increase the complexity. MICRONIC makes a wide range of laser pattern generators for display, reticles and other electronics applications, and therefore needs a hardware/software datapath that is configurable over a wide range of requirements and cost levels. An extendible multiprocessor architecture offers this flexibility: possibility for multiprocessing for very high power, and at the same time ability to configure small systems for low-end applications. Preliminary benchmarks show a speed increase over previous systems by 10 to 60 times for a single processor.
Paper Details
Date Published: 7 July 1997
PDF: 4 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276026
Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)
PDF: 4 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276026
Show Author Affiliations
Anders Thuren, Micronic Laser Systems AB (Sweden)
Torbjoern Sandstrom, Micronic Laser Systems AB (Sweden)
Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)
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