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Proceedings Paper

Toward a comprehensive control of full-field image quality in optical photolithography
Author(s): Donis G. Flagello; Jos de Klerk; Guy Davies; Richard Rogoff; Bernd Geh; Michael Arnz; Ulrich Wegmann; Michael Kraemer
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Paper Abstract

This paper shows, that as resolution is pushed into regions below 0.6 (lambda) /NA, understanding the effects of wavefront aberrations is crucial to producing stepper systems that can meet end-user requirements. We show how aberrations can affect the choice of optimum NA and partial coherence for a given reticle object when considering critical dimension uniformity and depth of focus. The ability to measure the complete wavefront and extract meaningful full-field aberration data is shown using an advanced through-the-lens interferometer that operates at the wavelength and bandwidth of the lithographic radiation. The impact of aberrations an image quality criteria is shown through a sensitivity analysis using an imaging approximation model that represents various image criteria as a weighted sum of aberration coefficients. The validity and use of such a model is shown by correlation to full- field experimental measurements.

Paper Details

Date Published: 7 July 1997
PDF: 14 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275987
Show Author Affiliations
Donis G. Flagello, ASM Lithography BV (Netherlands)
Jos de Klerk, ASM Lithography BV (Netherlands)
Guy Davies, ASM Lithography BV (Netherlands)
Richard Rogoff, ASM Lithography BV (Netherlands)
Bernd Geh, Carl Zeiss (Germany)
Michael Arnz, Carl Zeiss (Germany)
Ulrich Wegmann, Carl Zeiss (Germany)
Michael Kraemer, Carl Zeiss (Germany)

Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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