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Proceedings Paper

Plasma antireflective coating optimization using enhanced reflectivity modeling
Author(s): Kevin D. Lucas; Jamie A. Vasquez; Ajay Jain; Stanley M. Filipiak; Tam Vuong; Charles Fredrick King; Bernard J. Roman
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Paper Abstract

An improved method is presented for the optimization of plasma deposited bottom inorganic anti-reflective coatings (ARCs). These ARCs have shown the capability to improve photolithography profess margins through reduction of substrate reflectivity while meeting integration issues. However, the ability to vary plasma ARC optical properties through deposition conditions has led to increased complexity of film stack optimization. We present simple but effective enhanced modeling methods for reducing the effort required to properly tune plasma ARC optical conditions and optimize complex films tacks incorporating these materials.

Paper Details

Date Published: 7 July 1997
PDF: 11 pages
Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 10.1117/12.275918
Show Author Affiliations
Kevin D. Lucas, Motorola (United States)
Jamie A. Vasquez, Motorola (United States)
Ajay Jain, Motorola (United States)
Stanley M. Filipiak, Motorola (United States)
Tam Vuong, Motorola (United States)
Charles Fredrick King, Motorola (United States)
Bernard J. Roman, Motorola (United States)

Published in SPIE Proceedings Vol. 3050:
Metrology, Inspection, and Process Control for Microlithography XI
Susan K. Jones, Editor(s)

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