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Proceedings Paper

Use of highly absorptive azo dyes in photoresist coatings
Author(s): Ping-Hung Lu; Shuji Ding; T. T. Hannigan; D. E. Eberly; Elaine Kokinda; Sunit S. Dixit; Salem Mehtsun; Anthony J. Corso; Dinesh N. Khanna
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Paper Abstract

We recently synthesized and studied a number of highly absorptive diketo azo dyes. These materials, existed in the hydrazo tautomeric forms, showed high extinction coefficients, typically (epsilon) approximately equals 25,000 - 39,000 at 365 nm. They also exhibited good solubility in common resist casting solvents such as propylene glycol monoethyl acetate (PGMEA) and ethyl lactate. The thermostability of the materials was investigated. The impact of these diketo azo dyes on i-line resist performance in terms of swing reduction, reflective notching control and lithographic performance is discussed.

Paper Details

Date Published: 7 July 1997
PDF: 14 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275880
Show Author Affiliations
Ping-Hung Lu, Hoechst Celanese Corp. (United States)
Shuji Ding, Hoechst Celanese Corp. (United States)
T. T. Hannigan, Hoechst Celanese Corp. (United States)
D. E. Eberly, Hoechst Celanese Corp. (United States)
Elaine Kokinda, Hoechst Celanese Corp. (United States)
Sunit S. Dixit, Hoechst Celanese Corp. (United States)
Salem Mehtsun, Hoechst Celanese Corp. (United States)
Anthony J. Corso, Hoechst Celanese Corp. (United States)
Dinesh N. Khanna, Hoechst Celanese Corp. (United States)

Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

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