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Proceedings Paper

Robust i-line resist engineering using neural network and statistical design applications
Author(s): Medhat A. Toukhy; David J. Brzozowy
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Paper Abstract

The optimization of a resist formulation for performance robustness in addition to its basic lithographic performance provides added tolerance to formulation errors. This was demonstrated in this paper by the example of OiR-32 resist technology. The optimized components and the efficiency of the chemical interaction system between the novolak and the PACs of this resist are directly responsible for its robust performance.

Paper Details

Date Published: 7 July 1997
PDF: 9 pages
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275838
Show Author Affiliations
Medhat A. Toukhy, Olin Microelectronic Materials (United States)
David J. Brzozowy, Olin Microelectronic Materials (United States)

Published in SPIE Proceedings Vol. 3049:
Advances in Resist Technology and Processing XIV
Regine G. Tarascon-Auriol, Editor(s)

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