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Proceedings Paper

Three-dimensional electron-beam lithography simulation
Author(s): Chris A. Mack
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Paper Abstract

A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography. Monte Carlo simulations are combined with a beam shape to generate a single 'pixel' energy distribution. This pixel is then used to write a pattern by controlling the dose of every pixel on an address grid. The resulting dose pattern is used to expose and develop a resist to form a three-dimensional resist pattern.

Paper Details

Date Published: 7 July 1997
PDF: 13 pages
Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275807
Show Author Affiliations
Chris A. Mack, FINLE Technologies (United States)

Published in SPIE Proceedings Vol. 3048:
Emerging Lithographic Technologies
David E. Seeger, Editor(s)

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