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Proceedings Paper

Stability and stiffness characteristics of the national x-ray mask standard
Author(s): Adam H. Fisher; Michael A. Sprague; Roxann L. Engelstad; Daniel L. Laird; Steven C. Nash
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Paper Abstract

Finite element analyses have been performed to investigate the stability and stiffness characteristics of the ARPA-NIST National X-ray Mask Standard. The use of different materials (such as silicon carbide and Pyrex) for the support ring has been studied to identify the effects on the maximum in-plane mounting distortions (within a 50 mm by 50 mm patterned area). Additional finite element calculations have been completed to determine the out-of-plane distortions (or bowing) of the mask due to the fabrication process. Parametric studies have been performed to identify the stiffness characteristics of the mask as the overall ring thickness is reduced while the wafer thickness is increased. Results show how various design parameters can be controlled to repeatedly fabricate masks that fulfill requirements for sub-0.13 micrometer technology.

Paper Details

Date Published: 7 July 1997
PDF: 11 pages
Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275789
Show Author Affiliations
Adam H. Fisher, Univ. of Wisconsin/Madison (United States)
Michael A. Sprague, Univ. of Wisconsin/Madison (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
Daniel L. Laird, Sandia National Labs. (United States)
Steven C. Nash, IBM Microelectronics Div. (United States)

Published in SPIE Proceedings Vol. 3048:
Emerging Lithographic Technologies
David E. Seeger, Editor(s)

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