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Proceedings Paper

Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster's angle polarizers at 1064 nm
Author(s): Christopher J. Stolz; Francois Y. Genin; T. A. Reitter; Nicole E. Molau; Ron P. Bevis; Marc K. Von Gunten; Douglas J. Smith; J. F. Anzellotti
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Paper Abstract

HfO2/SiO2 Brewster's angle polarizers are being developed at Lawrence Livermore National Laboratory for the National Ignition Facility. Damage threshold studies using a 3-ns pulse length 1064-nm laser have revealed a number of different damage morphologies such as nodular ejection pits, plasma scalds, and overcoat delaminations. Of these laser damage morphologies, delaminations have the most negative impact on fusion laser performance. By increasing the thickness of the SiO2 overcoat, the delamination morphology is eliminated without significantly modifying the spectral characteristics of the coating. A model of the thermal mechanical response of the overcoats is presented for various SIO2 overcoat thicknesses. The overcoat thickness influences the electric-field profile resulting in different thermal gradients between the outer SiO2 and HfO2 layers. This modeling effort attempts to understand the relationship between the thermal stress distribution in the overcoat and the occurrence of delamination.

Paper Details

Date Published: 13 May 1997
PDF: 8 pages
Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); doi: 10.1117/12.274272
Show Author Affiliations
Christopher J. Stolz, Lawrence Livermore National Lab. (United States)
Francois Y. Genin, Lawrence Livermore National Lab. (United States)
T. A. Reitter, Lawrence Livermore National Lab. (United States)
Nicole E. Molau, Lawrence Livermore National Lab. (United States)
Ron P. Bevis, Spectra-Physics Lasers, Inc. (United States)
Marc K. Von Gunten, Spectra-Physics Lasers, Inc. (United States)
Douglas J. Smith, Univ. of Rochester (United States)
J. F. Anzellotti, Univ. of Rochester (United States)


Published in SPIE Proceedings Vol. 2966:
Laser-Induced Damage in Optical Materials: 1996
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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