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Proceedings Paper

Nanometer-scale lithography with chromium and helium atoms
Author(s): Thomas Schulze; Ulrich Drodofsky; B. Brezger; J. Stuhler; S. Nowak; Tilman Pfau; Juergen Mlynek
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Paper Abstract

We describe two experiments that use neutral atomic beam techniques to write nanostructures. In the chromium experiment we have used neutral chromium atoms to write periodic nanometerscale structures in a direct way. In a second experiment we have used a self-assembling monolayer as a resist for metastable helium atoms.

Paper Details

Date Published: 1 May 1997
PDF: 10 pages
Proc. SPIE 2995, Atom Optics, (1 May 1997); doi: 10.1117/12.273774
Show Author Affiliations
Thomas Schulze, Univ. Konstanz (Germany)
Ulrich Drodofsky, Univ. Konstanz (Germany)
B. Brezger, Univ. Konstanz (Germany)
J. Stuhler, Univ. Konstanz (Germany)
S. Nowak, Univ. Konstanz (Germany)
Tilman Pfau, Univ. Konstanz (Germany)
Juergen Mlynek, Univ. Konstanz (Germany)

Published in SPIE Proceedings Vol. 2995:
Atom Optics
Mara Goff Prentiss; William D. Phillips, Editor(s)

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