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Proceedings Paper

Characterization of thin metal films with overlayers by transparency and multiangle including surface plasmon excitation reflectance ellipsometry method
Author(s): Olga Yu. Borkovskaya; Nikolas L. Dmitruk; Oksana V. Fursenko
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Paper Abstract

The complex method of optical characterization of thin metal films with overlayers consisting of three types of measurements has ben developed and testified. It based on both transparency measurements and multi-angle reflectance ellipsometry including the surface plasmons excitation regime. The computation of layers thicknesses and their optical constants by the solution of the inverse ellipsometric problem using the modified method of general search and special choice of fitting function has been carried out. The method was used for Au and Ag layers evaporated on GaAs, InP or quartz substrates.

Paper Details

Date Published: 1 April 1997
PDF: 5 pages
Proc. SPIE 3094, Polarimetry and Ellipsometry, (1 April 1997); doi: 10.1117/12.271822
Show Author Affiliations
Olga Yu. Borkovskaya, Institute for Physics of Semiconductors (Ukraine)
Nikolas L. Dmitruk, Institute for Physics of Semiconductors (Ukraine)
Oksana V. Fursenko, Institute for Physics of Semiconductors (Ukraine)

Published in SPIE Proceedings Vol. 3094:
Polarimetry and Ellipsometry
Maksymilian Pluta; Tomasz R. Wolinski, Editor(s)

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