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Proceedings Paper

Processing of amorphous silicon flat panel displays with large-area excimer lasers
Author(s): Marc X. Stehle; Bruno Godard; Jean-Louis P. Stehle
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Paper Abstract

Historical background and present status of excimer laser annealing of amorphous silicon for poly-TFTs fabrication are presented. Scanning and single shot systems are compared both on the physical and economical aspects. Process optimization and process control using real time spectroscopic ellipsometry are also presented. Finally, some perspectives in the development of very high power excimer laser are also given.

Paper Details

Date Published: 4 April 1997
PDF: 6 pages
Proc. SPIE 2987, Gas and Chemical Lasers and Applications II, (4 April 1997); doi: 10.1117/12.271551
Show Author Affiliations
Marc X. Stehle, SOPRA (France)
Bruno Godard, SOPRA (France)
Jean-Louis P. Stehle, SOPRA (France)

Published in SPIE Proceedings Vol. 2987:
Gas and Chemical Lasers and Applications II
Robert C. Sze; Ernest A. Dorko, Editor(s)

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