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Proceedings Paper

Micro-optical and optomechanical systems fabricated by the LIGA technique
Author(s): Juergen Mohr; Jost Goettert; Andre Mueller; Patrick Ruther; Klaus Wengeling
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Paper Abstract

The LIGA process is used to fabricate micro-optical benches which allow to mount hybridically active and passive optical components with very high precision and without active alignment. Moreover, also micro mechanical structures like electro-mechanical actuators are fabricated on the same substrate. To avoid any lateral misalignment al fixing structures in the optical bench are produced in the lithography step. Due to the high precision of x-ray lithography lateral tolerances are in the range of 0.1 to 0.2 micrometers depending on thermal distortions. Thus, optical losses for these components are rather small. The potential of the free space concept based on LIGA technology for the fabrication of devices for optical telecommunication has been demonstrated by a bi-directional transceiver module as well as an optical bypass. In the case of the optical bypass element, a movable mirror is fabricated on the substrate together with the fixing elements. This movable mirror is the end face of an electro-static actuator which allows to move the mirror into the collimated light beam between two fibers and thus, change the direction of the light. For the first prototypes the losses in the beam without mirror are about 1.7 dB, whereas the losses in the deflected beam are about 4.5 dB.

Paper Details

Date Published: 11 April 1997
PDF: 6 pages
Proc. SPIE 3008, Miniaturized Systems with Micro-Optics and Micromechanics II, (11 April 1997); doi: 10.1117/12.271424
Show Author Affiliations
Juergen Mohr, Forschungszentrum Karlsruhe (Germany)
Jost Goettert, Forschungszentrum Karlsruhe (Germany)
Andre Mueller, Forschungszentrum Karlsruhe (Germany)
Patrick Ruther, Forschungszentrum Karlsruhe (Germany)
Klaus Wengeling, Forschungszentrum Karlsruhe (Germany)

Published in SPIE Proceedings Vol. 3008:
Miniaturized Systems with Micro-Optics and Micromechanics II
M. Edward Motamedi; Larry J. Hornbeck; Kristofer S. J. Pister, Editor(s)

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