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Proceedings Paper

Single-shot excimer laser annealing: a new tool for poly-AMLCD combined with spectroscopic ellipsometry
Author(s): Marc X. Stehle; Dorian Zahorski; Jean-Louis P. Stehle
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Paper Abstract

Historical background and present status of excimer laser annealing of amorphous silicon for poly-TFTs fabrication are presented. Scanning and single shot systems are compared both on the physical and economical aspects. Process optimization and process control using real time spectroscopic ellipsometry are also presented. Finally, some perspectives in the development of very high power excimer laser are also given.

Paper Details

Date Published: 10 April 1997
PDF: 7 pages
Proc. SPIE 3014, Active Matrix Liquid Crystal Displays Technology and Applications, (10 April 1997); doi: 10.1117/12.270295
Show Author Affiliations
Marc X. Stehle, SOPRA (France)
Dorian Zahorski, SOPRA (France)
Jean-Louis P. Stehle, SOPRA (France)

Published in SPIE Proceedings Vol. 3014:
Active Matrix Liquid Crystal Displays Technology and Applications
Tolis Voutsas; Tsu-Jae King, Editor(s)

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