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Proceedings Paper

Efficient VUV light sources from rare gas excimers and their applications
Author(s): Wataru Sasaki; Shoichi Kubodera; Junji Kawanaka
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Paper Abstract

Efficient VUV excimer lamps with two types of discharge configurations, expanding jet discharge and silent discharge (dielectric-barrier discharge) in a variety of rare gases and their mixtures, are presented. In the jet discharges VUV output power was 9 mW with an efficiency of 10-2% at 126 nm for argon excimers. Output powers of other excimers were 300 mW with 1.0% efficiency at 146 nm for krypton excimers and 500 mW with 1.6% efficiency at 176 nm for xenon excimers. Simultaneous emissions from hetero-nuclear rare gas excimers (ArKr*, 135 nm) as well as homo-nuclear rare gas excimers (Ar2* and Kr2*) were observed by using rare gas mixtures of argon and krypton. Output powers and efficiencies of the silent discharge excimer lamps were 500 mW and 1.6% for argon, 5 W and 13% for krypton, and 5 W and 20% for xenon excimers. In the silent discharge extremely broad band excimer emissions were observed at the center wavelengths of 145 nm for an argon/krypton mixture and of 163 nm for a krypton/xenon mixture. A PMMA plate was photo-chemically etched at the rates of 1 - 2 nm/min by the irradiation of the 172 nm radiation in air and argon gas atmospheres.

Paper Details

Date Published: 4 April 1997
PDF: 4 pages
Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); doi: 10.1117/12.270264
Show Author Affiliations
Wataru Sasaki, Univ. of Miyazaki (Japan)
Shoichi Kubodera, Univ. of Miyazaki (Japan)
Junji Kawanaka, Univ. of Miyazaki (Japan)


Published in SPIE Proceedings Vol. 3092:
XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Denis R. Hall; Howard J. Baker, Editor(s)

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