Proceedings Paper
Performance of 1 kHz KrF excimer laser for DUV lithography| Format | Member Price | Non-Member Price |
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Paper Abstract
In response to the requirement for higher wafer throughput and increased dosage accuracy in DUV lithography steppers and scanners, Cymer has developed a 1 kHz KrF laser optimized for this application. We shall describe its performance and design features.
Paper Details
Date Published: 4 April 1997
PDF: 4 pages
Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); doi: 10.1117/12.270109
Published in SPIE Proceedings Vol. 3092:
XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Denis R. Hall; Howard J. Baker, Editor(s)
PDF: 4 pages
Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); doi: 10.1117/12.270109
Show Author Affiliations
Palash P. Das, Cymer, Inc. (United States)
Richard G. Morton, Maxwell Labs., Inc. (United States)
Igor V. Fomenkov, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
Richard G. Morton, Maxwell Labs., Inc. (United States)
Igor V. Fomenkov, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
Richard L. Sandstrom, Cymer, Inc. (United States)
Cynthia A. Maley, Cymer Inc. (United States)
Ray Cybulski, Cymer, Inc. (United States)
Cynthia A. Maley, Cymer Inc. (United States)
Ray Cybulski, Cymer, Inc. (United States)
Published in SPIE Proceedings Vol. 3092:
XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Denis R. Hall; Howard J. Baker, Editor(s)
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