Share Email Print

Proceedings Paper

In-situ monitoring of carbon dimer formation within ablation plume
Author(s): Maria A. Stepanova; Vladimir N. Anisimov; Oleg N. Derkach; Valeria G. Grishina; Andrey Yu. Sebrant
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Carbon dimer formation during ablation plume expansion and subsequent interaction with a substrate is recognized to affect substantially the process of pulsed laser deposition (PLD) of thin films. In this work we report formation of C2 molecules during laser ablation from graphite targets under conditions typical for PLD. Two types of lasers were used for ablation -- 5 microsecond carbon-dioxide laser operated at 1 J and 10 ns Nd-YAG laser operated at 100 mJ in the second harmonic. We present results of time-resolved (50 ns) emission spectroscopy, plasma imaging and time-of-flight techniques. C2 molecules formation has been studied in a variety of experimental conditions, including ablation plume interaction with target surface, plume interaction with the surface of a substrate and two-plasmas interaction. Particularly no molecules formation was observed at maximum energy and there was an optimum laser pulse energy for dimers formation for short pulses of Nd:YAG laser. The plumes in both cases had shell like structure with high ions inside and neutrals located in the outer layers. Molecules formation occurred to be more efficient in the outer layers of the plume in the case of carbon-dioxide laser.

Paper Details

Date Published: 27 March 1997
PDF: 11 pages
Proc. SPIE 2993, Lasers as Tools for Manufacturing II, (27 March 1997); doi: 10.1117/12.270029
Show Author Affiliations
Maria A. Stepanova, Resonetics, Inc. (United States)
Vladimir N. Anisimov, Troitsk Kurchatov Research Institute (Russia)
Oleg N. Derkach, Troitsk Kurchatov Research Institute (Russia)
Valeria G. Grishina, Troitsk Kurchatov Research Institute (Russia)
Andrey Yu. Sebrant, Troitsk Kurchatov Research Institute (Russia)

Published in SPIE Proceedings Vol. 2993:
Lasers as Tools for Manufacturing II
Leonard R. Migliore; Ronald D. Schaeffer, Editor(s)

© SPIE. Terms of Use
Back to Top