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Proceedings Paper

Advanced model for resist heating effect simulation in electron-beam lithography
Author(s): Sergey V. Babin; V. V. Kozunov; Igor Yu. Kuzmin
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Paper Abstract

A mathematical model of resist heating was developed based on the 3D classic heat conductivity equation in a multilayer object. A tabulation of special functions used for numerical calculation allows the analytical solution to be simplified to one only integral for both variably shaped beam and Gaussian beam. As a result, a dynamic distribution of temperature field in resist can be simulated for an exposure process in terms of thickness and characteristics of resist and multilayer substrate, as well as size, placement and consequence of flashes. Results of simulation are shown for both short and long time range exposures.

Paper Details

Date Published: 27 December 1996
PDF: 7 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262844
Show Author Affiliations
Sergey V. Babin, Set-Service (United States)
V. V. Kozunov, Set-Service (Russia)
Igor Yu. Kuzmin, Set-Service (Russia)

Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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