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Proceedings Paper

On-product metrology results from MEBES 4-TFE System
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Paper Abstract

At Lucent Technologies, lithography tool performance metric measurements are required on every plate. The QA cell patterning is designed to monitor the lithography tool, and the data is captured within the Mask Information Management System. It allows the manufacturer to use actual production data to determine machine performance trends, and it yields an extremely large sample of plates for SPC purposes. Closure, X vs. Y uniformity, butting, and registration data is reported in this way. The usage of on-product data for machine metrology is demonstrated, and actual production performance of the MEBES 4 TFE is shown.

Paper Details

Date Published: 27 December 1996
PDF: 9 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262832
Show Author Affiliations
Christopher P. Braun, Lucent Technologies (United States)
Frederick R. Peiffer, Lucent Technologies (United States)

Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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