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Proceedings Paper

Advances in process matching for rules-based optical proximity correction
Author(s): Oberdan W. Otto; Richard C. Henderson
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Paper Abstract

This paper reports advances to the Parametric Anchoring methodology in which a small number of representative line- space process measurements can be used to fit a process model to be used for Optical Proximity Correction (OPC). A correction rule table generation program uses the model to create the correction lookup tables to be used by a rules- based OPC correction program. The results of matching the process model to a variety of processes are shown.

Paper Details

Date Published: 27 December 1996
PDF: 10 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262828
Show Author Affiliations
Oberdan W. Otto, Trans Vector Technologies, Inc. (United States)
Richard C. Henderson, Trans Vector Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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