Share Email Print

Proceedings Paper

Through pellicle coordinate metrology
Author(s): Hiroaki Okamoto; David E. Kettering
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Attaching a pellicle and frame to a photomask induces stresses which change the position of patterns on the mask by up to 100 nm depending upon factors including mounting procedure, mask thickness, and overall mask size. The Nikon XY-5i is used to measure the pattern placement before and after pelliclization to establish changes in the array due to the pelliclization process. The importance of this type of analysis as it relates to the overall mask error budget will be explored. The XY-5i system capability and technology to repeatably measure the pattern placement through the pellicle will be explained. Data gathered from several photomask sizes and thickness will be presented. In addition, automatic and manual pelliclization processes will be compared.

Paper Details

Date Published: 27 December 1996
PDF: 14 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262803
Show Author Affiliations
Hiroaki Okamoto, Nikon Precision Inc. (United States)
David E. Kettering, Nikon Precision Inc. (United States)

Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

© SPIE. Terms of Use
Back to Top