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Proceedings Paper

Multichamber rapid thermal processing
Author(s): Paul J. Rosser; P. Moynagh; Kevin B. Affolter
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Paper Abstract

Silicon processing makes ever-increasing demands on the capabilities and quality of processing equipment. Rapid thermal processing (RTP) enables the use of thermally activated processes with the minimum thermal budget. Multi-chamber systems minimise turn around time whilst providing a high quality processing environment. This paper seeks to identify the issues associated with the use of RTP in multi-chamber systems from the reasons for considering it to the further work required to optimise it. 1.

Paper Details

Date Published: 1 April 1991
PDF: 18 pages
Proc. SPIE 1393, Rapid Thermal and Related Processing Techniques, (1 April 1991); doi: 10.1117/12.25691
Show Author Affiliations
Paul J. Rosser, STC Technology Ltd. (United Kingdom)
P. Moynagh, STC Technology Ltd. (United Kingdom)
Kevin B. Affolter, STC Technology Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 1393:
Rapid Thermal and Related Processing Techniques
Rajendra Singh; Mehrdad M. Moslehi, Editor(s)

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