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Proceedings Paper

Application of metallic subwavelength gratings for polarization devices
Author(s): Ernst-Bernhard Kley; Bernd Schnabel; Heike Huebner; Uwe D. Zeitner
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Paper Abstract

E-beam lithography offers the possibility for fabricating metallic subwavelength gratings for visible light which show strong polarization properties. By using such gratings and other micro-optical elements (like lenses and diffraction gratings) a new kind of polarization detector without mechanical motion is proposed. The basic idea is the use of a special analyzing grating element with different grating directions (e.g. a circular metallic subwavelength grating). We realized both a wavelength-independent polarimeter and a polarimeter with spectroscopic properties. Characteristic parameters estimated are the angular resolution of the polarization plane (best value 0.001 degree) and the wavelength resolution (best value 15 nm).

Paper Details

Date Published: 1 November 1996
PDF: 9 pages
Proc. SPIE 2863, Current Developments in Optical Design and Engineering VI, (1 November 1996); doi: 10.1117/12.256221
Show Author Affiliations
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Bernd Schnabel, Friedrich-Schiller-Univ. Jena (Germany)
Heike Huebner, Friedrich-Schiller-Univ. Jena (Germany)
Uwe D. Zeitner, Friedrich-Schiller-Univ. Jena (Germany)

Published in SPIE Proceedings Vol. 2863:
Current Developments in Optical Design and Engineering VI
Robert E. Fischer; Warren J. Smith, Editor(s)

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