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Proceedings Paper

Combining UV-and electron-beam lithography for superconducting bandpass filters in mm/sub-mm astronomy
Author(s): David Thoen; Vignesh Murugesan; Kenichi Karatsu; Alejandro Pascual Laguna; Akira Endo; Jochem J. A. Baselmans
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Paper Abstract

Microfabrication of on-chip filterbanks, such as DESHIMA 2.0, would greatly benefit from reliable fabrication with sub-micrometer resolution. This enables smaller devices and reduces scatter in parameters such as filter bandwidth and resonant frequency. Here we present “mix-and-match” processing by combining optical and electron-beam exposures of a single layer of negative ma-N1405 resist from Micro-Resist-Technology GmbH. This allows for minimal features down to 300 nm where needed and large structure exposure with UV, limiting e-beam writing time. Relative alignment is possible to less than 500 nm on a regular basis.

Paper Details

Date Published: 13 December 2020
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Proc. SPIE 11453, Millimeter, Submillimeter, and Far-Infrared Detectors and Instrumentation for Astronomy X, 114532Q (13 December 2020); doi: 10.1117/12.2561452
Show Author Affiliations
David Thoen, Technische Univ. Delft (Netherlands)
Vignesh Murugesan, SRON Netherlands Institute for Space Research (Netherlands)
Kenichi Karatsu, SRON Netherlands Institute for Space Research (Netherlands)
Alejandro Pascual Laguna, SRON Netherlands Institute for Space Research (Netherlands)
Akira Endo, Technische Univ. Delft (Netherlands)
Jochem J. A. Baselmans, Technische Univ. Delft (Netherlands)
SRON Netherlands Institute for Space Research (Netherlands)


Published in SPIE Proceedings Vol. 11453:
Millimeter, Submillimeter, and Far-Infrared Detectors and Instrumentation for Astronomy X
Jonas Zmuidzinas; Jian-Rong Gao, Editor(s)

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