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Proceedings Paper

UV, soft x-ray, and gamma-ray high-resolution imaging and discrimination by a novel photopolymer film system
Author(s): Mohamad Al-Sheikhly; William L. McLaughlin; Aristos Christou; Christos A. Christou
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Paper Abstract

A novel form of thin-coated transparent polymer film undergoes a radiation-initiated solid-state polymerization reaction when irradiated with deep ultraviolet and x and gamma rays. It forms a permanent deep-blue high-resolution image, without the need for chemical, optical, or thermal processing. The increase in the optical density with absorbed dose, irradiance or photon fluence is a linear function with relatively high contrast and without appreciable reciprocity failure and has the same response in vacuum and in air. The sensor coating thickness on a polyester base is approximately 6 micrometer. It forms the radiation-induced image that can resolve 600 line pairs per millimeter. The ultraviolet sensitivity at 266 nm wavelength is such that the optical density produced by an irradiance of 30 mJ/cm2 is approximately 1.00 at the wavelength maximum of the absorption spectrum (670 nm). UV, low-energy x-ray (10 keV) and gamma-ray (660 keV) response characteristics are presented, which demonstrate the ability to evaluate and map radiation image distributions quantitatively. The films are useful to calibrate beam profiles, including the penumbra shapes, because of the wide dynamic range and linear response.

Paper Details

Date Published: 31 October 1996
PDF: 5 pages
Proc. SPIE 2808, EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy VII, (31 October 1996);
Show Author Affiliations
Mohamad Al-Sheikhly, Univ. of Maryland/College Park (United States)
William L. McLaughlin, National Institute of Standards and Technology (United States)
Aristos Christou, Univ. of Maryland/College Park (United States)
Christos A. Christou, National Institute of Standards and Technology (United States)

Published in SPIE Proceedings Vol. 2808:
EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy VII
Oswald H. W. Siegmund; Mark A. Gummin, Editor(s)

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