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Proceedings Paper

Super-resolution imaging through microspheres (Conference Presentation)

Paper Abstract

Microsphere-assisted microscopy is a new two-dimensional super-resolution imaging technique, which allows the diffraction limit to be overcome by introducing a transparent microsphere in a classical optical microscope. This super-resolution technique makes it possible to reach a lateral resolution of up to one hundred nanometres (~λ/6) in air. Furthermore, microsphere-assisted microscopy distinguishes itself from others by being able to perform label-free and full-field acquisitions and requires only slight modifications of a classical white light microscope. This presentation gives an overview of the results of simulations and experiments we have performed over the last four years. The influence of the photonic jet on the image nature and the unconventional behaviour of the magnification factor is presented. In addition, the phenomenon behind the super resolution, which is still not fully understood, is discussed. Moreover, a new microsphere-based imaging device which enables the metrology of transparent nano-structures is shown. Finally, interferometry through microspheres is demonstrated for the 3D reconstruction of nano-elements. In order to provide a better understanding of the phase behaviour through microspheres, a numerical model of microsphere-assisted interference microscopy is being implemented.

Paper Details

Date Published: 1 April 2020
Proc. SPIE 11352, Optics and Photonics for Advanced Dimensional Metrology, 113520T (1 April 2020); doi: 10.1117/12.2556083
Show Author Affiliations
Stéphane Perrin, Lab. des sciences de l'Ingénieur, de l'Informatique et de l'Imagerie (France)
Univ. de Strasbourg (France)
Sylvain Lecler, Lab. des sciences de l'Ingénieur, de l'Informatique et de l'Imagerie (France)
Institut National des Sciences Appliquées de Strasbourg (France)
Paul Montgomery, Lab. des sciences de l'Ingénieur, de l'Informatique et de l'Imagerie (France)

Published in SPIE Proceedings Vol. 11352:
Optics and Photonics for Advanced Dimensional Metrology
Peter J. de Groot; Richard K. Leach; Pascal Picart, Editor(s)

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