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Proceedings Paper

Scalable fabrication of nano-architected materials using 3D interference lithography with metasurfaces at visible wavelengths (Conference Presentation)

Paper Abstract

Nano-architected materials have the potential to be adopted in several areas including photonic devices and structural materials. We present a 3D interference lithography technique with dielectric metasurfaces at visible wavelengths that allows patterning of thick epoxide films over areas on the order of 10 cm^2 with 100 nm resolution. By leveraging the ability of the metasurface to control the amplitude and phase of a wavefront, complex near-field 3D interference patterns can be designed. Pyrolysis of 3D patterned SU-8 produces a carbon-based material with sub-100 nm features and enhanced mechanical properties.

Paper Details

Date Published: 10 March 2020
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Proc. SPIE 11289, Photonic and Phononic Properties of Engineered Nanostructures X, 112890I (10 March 2020); doi: 10.1117/12.2555112
Show Author Affiliations
Phillippe Pearson, Caltech (United States)
Seyedeh Mahsa Kamali, Caltech (United States)
Farzaneh Afshinmanesh, Caltech (United States)
Luizetta Navrazhnykh, Caltech (United States)
Ryan Ng, Caltech (United States)
Andrei Faraon, Caltech (United States)
Julia R. Greer, Caltech (United States)


Published in SPIE Proceedings Vol. 11289:
Photonic and Phononic Properties of Engineered Nanostructures X
Ali Adibi; Shawn-Yu Lin; Axel Scherer, Editor(s)

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