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Proceedings Paper

Electronic image adjustment device for e-beam lithography
Author(s): Warren K. Waskiewicz
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Paper Abstract

A cumbersome necessity in lithography tools is the need to provide for a mechanical wafer rotation in order to achieve overlay. In contrast to photolithographic tools, charged particle lithography systems potentially offer a non- mechanical means of adjusting image orientation through the use of magnetic fields. I have identified a type of device, based upon simple, solenoid-like coils, which can simultaneously provide independent electronic adjustments to both image rotation and magnification. The implementation of such a device in a SCALPELTM-based proof-of-lithography tool is presented as a practical example.

Paper Details

Date Published: 25 October 1996
PDF: 10 pages
Proc. SPIE 2858, Charged-Particle Optics II, (25 October 1996); doi: 10.1117/12.255506
Show Author Affiliations
Warren K. Waskiewicz, Lucent Technologies, Bell Labs. (United States)


Published in SPIE Proceedings Vol. 2858:
Charged-Particle Optics II
Eric Munro, Editor(s)

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