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Proceedings Paper

Achieving stitchless full chip curvilinear ILT in a day (Conference Presentation)

Paper Abstract

Achieving stitchless full chip ILT in a day through a combination of mathematics and physics, high performance computing (HPC) methods, GPU acceleration, and tailoring our computational design platform (CDP) to the task is discussed.

Paper Details

Date Published: 25 March 2020
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Proc. SPIE 11327, Optical Microlithography XXXIII, 1132708 (25 March 2020); doi: 10.1117/12.2554808
Show Author Affiliations
P. Jeffrey Ungar, D2S, Inc. (United States)
Ali Bouaricha, D2S, Inc. (United States)
Ryan Pearman, D2S, Inc. (United States)
Linyong Pang, D2S, Inc. (United States)
Aki Fujimura, D2S, Inc. (United States)


Published in SPIE Proceedings Vol. 11327:
Optical Microlithography XXXIII
Soichi Owa, Editor(s)

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