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Proceedings Paper

Physical properties of CrxN thin films
Author(s): Taras T. Kovaliuk; Mykhailo M. Solovan; Orest A. Parfenyuk; Ivan P. Koziarskyi; Pavlo D. Maryanchuk
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Paper Abstract

Chromium nitride (CrxN) thin films were deposited by DC reactive magnetron sputtering at different ratios between partial pressures of nitrogen. Electrical and optical properties of the thin films were investigated. Temperature dependences of the resistance R of the CrxN films were measured within the temperature range T ÷ 295-420 K. Based on the dependences α2 = f(hν), the presence of direct allowed interband optical transitions in the CrxN thin films is established and the optical band gap values are determined for all sample before and after annealing.

Paper Details

Date Published: 6 February 2020
PDF: 6 pages
Proc. SPIE 11369, Fourteenth International Conference on Correlation Optics, 113691F (6 February 2020);
Show Author Affiliations
Taras T. Kovaliuk, Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)
Mykhailo M. Solovan, Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)
Orest A. Parfenyuk, Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)
Ivan P. Koziarskyi, Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)
Pavlo D. Maryanchuk, Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)


Published in SPIE Proceedings Vol. 11369:
Fourteenth International Conference on Correlation Optics
Oleg V. Angelsky, Editor(s)

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