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Proceedings Paper

Enhancing the reactivity of polymerizable antimony carboxylate EUV photoresists (Conference Presentation)
Author(s): Michael Murphy; James Passarelli; Maximilian Weires; Jodi Grzeskowiak; Robert L. Brainard

Paper Abstract

Antimony(V) carboxylate photoresists incorporating polymerizable olefins have demonstrated high photospeeds. The work of Passarelli et al. reported a sensitivity hypothesis, polymerizable olefin loading (POL), in which an increase in photospeed correlates to an increase in the number of olefins per molecular weight of resist.1 Utilizing this sensitivity trend, a photoresist of higher molecular weight, triphenylantimony(V) bis(4-vinylbenzoate) (JP-30), was developed exhibiting moderate photospeed at the cost of improved pattern fidelity. Herein we report three approaches for improving the lithographic performance of polymerizable olefin antimony carboxylate photoresists. Approach 1 increased the number of olefins per molecule through functionalization of the R-group. Tristyreneantimony(V) dicarboxylate photoresists were lithographically evaluated exhibiting high photospeeds and improved resolution capabilities (Figure 1). Approach 2 examined the benefits of blending two antimony carboxylate photoresists with high and low POL values and observing the changes in photospeed. Approach 3 increased the POL relative to JP-30 through reduction in molecular weight of the R-groups by the synthesis and lithographic evaluation of trimethylantimony(V) bis(4-vinylbenzoate).

Paper Details

Date Published: 24 March 2020
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Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 1132605 (24 March 2020);
Show Author Affiliations
Michael Murphy, SUNY Polytechnic Institute (United States)
James Passarelli, Northwestern Univ. (United States)
Maximilian Weires, SUNY Polytechnic Institute (United States)
Jodi Grzeskowiak, TEL Technology Ctr., America, LLC (United States)
Robert L. Brainard, SUNY Polytechnic Institute (United States)


Published in SPIE Proceedings Vol. 11326:
Advances in Patterning Materials and Processes XXXVII
Roel Gronheid; Daniel P. Sanders, Editor(s)

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